Inventor
Klaus-Dieter Rinnen
Inventor
Palo Alto, CA, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material29%
H10DInorganic electric semiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
PatentTitleYear
6,284,650'Integrated tungsten-silicide processes'20016,193,813'Utilization of SiH4 soak and purge in deposition processes'20015,997,950'Substrate having uniform tungsten silicide film and method of manufacture'19995,943,230'Computer-implemented inter-chamber synchronization in a multiple chamber substrate processing system'19995,817,576'Utilization of SiH.sub.4 soak and purge in deposition processes'19985,780,360'Purge in silicide deposition processes dichlorosilane'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2001Patents assigned to APPLIED MATERIALS INC (6)· patent assignee history
1998–2001Based in Palo Alto, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 6 | 1998–2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Palo Alto, California, US | 6 | 1998–2001 |