Inventor

Yasutomo Fujiyama

Inventor

Kawasaki, JP

Overview

1985–2000

Patent span

Chemistry

Primary field (CPC C)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material38%

H01JElectric discharge tubes or discharge lamps29%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%

B08BCleaning in general2%

C23FNon-mechanical removal of metallic material from surface2%

C25DProcesses for the electrolytic or electrophoretic production of coatings2%

G02BOptical elements, systems or apparatus2%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%

PatentTitleYear

6,058,945'Cleaning methods of porous surface and semiconductor surface'2000 5,754,344'Head-mounted stereoscopic image display apparatus'1998 5,458,755'Anodization apparatus with supporting device for substrate to be treated'1995 5,038,712'Apparatus with layered microwave window used in microwave plasma chemical vapor deposition process'1991 4,958,185'Photographing apparatus'1990 4,909,183'Apparatus for plasma CVD'1990 4,909,184'Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process'1990 4,732,792'Method for treating surface of construction material for vacuum apparatus, and the material treated thereby and vacuum treatment apparatus having the treated material'1988 4,719,873'Film forming apparatus'1988 4,709,656'Layer forming apparatus'1987 4,666,734'Apparatus and process for mass production of film by vacuum deposition'1987 4,648,348'Plasma CVD apparatus'1987 4,646,681'Gaseous phase method accumulated film manufacturing apparatus'1987 4,637,342'Vacuum processing apparatus'1987 4,633,812'Vacuum plasma treatment apparatus'1987 4,599,971'Vapor deposition film forming apparatus'1986 4,545,328'Plasma vapor deposition film forming apparatus'1985 4,539,934'Plasma vapor deposition film forming apparatus'1985 4,529,474'Method of cleaning apparatus for forming deposited film'1985 4,526,644'Treatment device utilizing plasma'1985

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985–2000Patents assigned to CANON KK (20)· patent assignee history

1985–1990Based in Kawasaki, JP· patent location history

1987–1991Based in Tokyo, JP· patent location history

1987Based in Yokohama, JP· patent location history

1995–2000Based in Atsugi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	20	1985–2000

Locations

Location	Patents	Span
Kawasaki, JP	9	1985–1990
Tokyo, JP	7	1987–1991
Atsugi, JP	3	1995–2000
Yokohama, JP	1	1987