Inventor

Martin Hostalek

Inventor
Darmstadt, DE

Overview

11→
Patents
1991–2006
Patent span
Chemistry
Primary field (CPC C)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Fprimary
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium21%
C23CCoating metallic material18%
C01BNon-metallic elements14%
C30BSingle-crystal growth11%
B01DSeparation7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%
C01CAmmonia4%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds4%
C09GPolishing compositions4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2005Patents assigned to MERCK PATENT GMBH (10)· patent assignee history
1991–2005Based in Darmstadt, DE· patent location history
2006Patents assigned to BASF AG (1)· patent assignee history
2006Based in Darmstadt-Arheilgen, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MERCK PATENT GMBH101991–2005
BASF AG12006
Locations
LocationPatentsSpan
Darmstadt, DE101991–2005
Darmstadt-Arheilgen, DE12006