Inventor

Kinji Yamada

Inventor

Ibaraki, JP

Overview

1989–2016

Patent span

Chemistry

Primary field (CPC C)

Patents· 33 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Dprimary

C09DCoating compositions, e.g. paints, varnishes or lacquers22%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%

Y10TTechnical subjects covered by former us classification16%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds13%

C08LCompositions of macromolecular compounds7%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%

C08JWorking-up3%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%

H01BCables3%

H05KPrinted circuits3%

PatentTitleYear

9,447,232'Carrier polymer particle, process for producing the same, magnetic particle for specific trapping, and process for producing the same'2016 8,247,289'Capacitor and manufacturing method thereof'2012 7,754,806'Biological substance related article and method of manufacturing the same, and biological substance adsorption preventive coating composition and method of using the same'2010 7,742,277'Dielectric film capacitor and method of manufacturing the same'2010 7,569,622'Biological substance related article and method of manufacturing the same, and biological substance adsorption preventive coating composition and method of using the same'2009 7,153,767'Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing'2006 7,128,976'Composition for film formation, method of film formation, and silica-based film'2006 6,890,605'Method of film formation, insulating film, and substrate for semiconductor'2005 6,884,862'Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film'2005 6,852,370'Composition for film formation and material for insulating film formation'2005 6,824,833'Stacked film, insulating film and substrate for semiconductor'2004 6,800,330'Composition for film formation, method of film formation, and silica-based film'2004 6,787,193'Method for the formation of silica film, silica film, insulating film, and semiconductor device'2004 6,749,944'Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor'2004 6,642,352'Method of manufacturing material for forming insulating film'2003 6,576,393'Composition for resist underlayer film and method for producing the same'2003 6,558,747'Method of forming insulating film and process for producing semiconductor device'2003 6,528,605'Diyne-containing (co)polymer, processes for producing the same, and cured film'2003 6,503,633'Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film'2003 6,472,079'Composition for film formation, method of film formation, and silica-based film'2002 6,468,589'Composition for film formation and insulating film'2002 6,465,368'Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film'2002 6,410,150'Composition for film formation, method of film formation, and insulating film'2002 6,410,151'Composition for film formation, method of film formation, and insulating film'2002 6,406,794'Film-forming composition'2002 6,376,634'Composition for film formation and material for insulating film formation'2002 6,313,233'Curable resin composition cured products'2001 6,235,101'Composition for film formation and film'2001 6,051,665'Coating composition'2000 6,011,123'Curable resin composition and cured products'2000 5,905,109'Water-type dispersion composition'1999 5,306,759'Coating composition and process for manufacturing the same'1994 4,830,672'Zirconia-based coating composition'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–1994Patents assigned to JAPAN SYNTHETIC RUBBER CO LTD (2)· patent assignee history

1989–1994Based in Yokkaichi, JP· patent location history

1999–2016Patents assigned to JSR CORP (29)· patent assignee history

1999–2016Based in Tsukuba, JP· patent location history

2001–2006Based in Ibaraki, JP· patent location history

2002–2003Patents assigned to TOSHIBA KK (2)· patent assignee history

2010–2012Based in Tokyo, JP· patent location history

2010Based in Chuo-ku, JP· patent location history

2012Patents assigned to HARADA MUNEO (1)· patent assignee history

2012Patents assigned to HIROTA YOSHIHIRO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
JSR CORP	29	1999–2016
JAPAN SYNTHETIC RUBBER CO LTD	2	1989–1994
TOSHIBA KK	2	2002–2003
HARADA MUNEO	1	2012
HIROTA YOSHIHIRO	1	2012

Locations

Location	Patents	Span
Ibaraki, JP	20	2001–2006
Tsukuba, JP	8	1999–2016
Tokyo, JP	2	2010–2012
Yokkaichi, JP	2	1989–1994
Chuo-ku, JP	1	2010