Inventor

Alexandre Likhanskii

Inventor
Malden, MA, US

Overview

30→
Patents
2010–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 30 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps64%
B08BCleaning in general7%
H05HPlasma technique7%
C02FTreatment of water, waste water, sewage, or sludge4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
B64CAeroplanes2%
B64DEquipment for fitting in or to aircraft2%
C23CCoating metallic material2%
F05DIndexing scheme for aspects relating to non-positive-displacement machines or engines, gas-turbines or jet-propulsion plants2%
F15DFluid dynamics, i.e. methods or means for influencing the flow of gases or liquids2%
PatentTitleYear
11,127,557Ion source with single-slot tubular cathode202111,037,758In-situ plasma cleaning of process chamber components202111,011,343High-current ion implanter and method for controlling ion beam using high-current ion implanter202110,937,624Apparatus and method for controlling ion beam using electrostatic filter202110,923,306Ion source with biased extraction plate202110,886,098Electrostatic filter and ion implanter having asymmetric electrostatic configuration202110,804,068Electostatic filter and method for controlling ion beam properties using electrostatic filter202010,790,116Electostatic filter and method for controlling ion beam using electostatic filter202010,763,072Apparatus, system and techniques for mass analyzed ion beam202010,714,301Conductive beam optics for reducing particles in ion implanter202010,665,433Extreme edge uniformity control202010,665,415Apparatus and method for controlling ion beam properties using electrostatic filter202010,522,330In-situ plasma cleaning of process chamber components201910,504,682Conductive beam optic containing internal heating element201910,410,844RF clean system for electrostatic elements201910,290,462High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture201910,224,181Radio frequency extraction system for charge neutralized ion beam201910,192,727Electrodynamic mass analysis201910,074,514Apparatus and method for improved ion beam current201810,068,758Ion mass separation using RF extraction20189,988,711Apparatus and method for multilayer deposition20189,922,795'High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture'20189,761,410'Apparatus and method for in-situ cleaning in ion beam apparatus'20179,721,750'Controlling contamination particle trajectory from a beam-line electrostatic element'20179,685,298'Apparatus and method for contamination control in ion beam apparatus'20179,613,777'Uniformity control using adjustable internal antennas'20179,520,259'Ion beam uniformity control'20169,478,399'Multi-aperture extraction system for angled ion beam'20169,230,773'Ion beam uniformity control'20167,744,039'Systems and methods for controlling flows with electrical pulses'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010Patents assigned to BOEING CO (1)· patent assignee history
2010Patents assigned to UNIV PRINCETON (1)· patent assignee history
2010Based in Princeton, NJ, US· patent location history
2016–2021Patents assigned to VARIAN SEMICONDUCTOR EQUIPMENT ASS INC (19)· patent assignee history
2016Patents assigned to VARIAN SEMICONDUCTOR EQUIPMENT (1)· patent assignee history
2016–2021Based in Malden, MA, US· patent location history
2020–2021Patents assigned to APPLIED MATERIALS INC (9)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC192016–2021
APPLIED MATERIALS INC92020–2021
BOEING CO12010
UNIV PRINCETON12010
VARIAN SEMICONDUCTOR EQUIPMENT12016
Locations
LocationPatentsSpan
Malden, Massachusetts, US292016–2021
Princeton, New Jersey, US12010