Inventor
Max H. Stern
Inventor
Rochester, NY, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Cprimary
G03CPhotosensitive materials for photographic purposes42%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
C07DHeterocyclic compounds17%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments17%
PatentTitleYear
4,749,641'Imaging element containing dye masking coupler'19884,596,876'Phthalaldehyde adducts'19864,499,304'Color-forming sulfonamidodiphenylamines and corresponding sulfonimide dyes'19854,410,623'Phthalaldehyde adduct and imaging compositions, elements and methods incorporating same'19834,390,606'Color-forming para-sulfonamidodiphenylamine dye precursor and sulfonimide dye in photographic material and process'1983Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1983–1988Patents assigned to EASTMAN KODAK CO (5)· patent assignee history
1983–1988Based in Rochester, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 5 | 1983–1988 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rochester, New York, US | 5 | 1983–1988 |