LexDanaLexDanabeta
Inventor

Kazuyuki Yamasaki

Inventor
Hiroshima, JP

Overview

68→
Patents
1985–2021
Patent span
General tagging of new technological developments
Primary field (CPC Y)

Patents· 68 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C02Fprimary
C02FTreatment of water, waste water, sewage, or sludge30%
Y02WClimate change mitigation technologies related to wastewater treatment or waste management19%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
B01DSeparation9%
B01FMixing, e.g. dissolving, emulsifying or dispersing3%
G11CStatic stores3%
Y02ATechnologies for adaptation to climate change3%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%
C08LCompositions of macromolecular compounds2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds1%
PatentTitleYear
11,015,249Silver-coated silicone rubber particles, conductive paste containing same, and a conductive film production method using conductive paste202110,254,572Inverting device and method for manufacturing liquid crystal display panel201910,031,377Nozzle head and liquid dispensing device20188,317,165'Nanobubble-containing liquid producing apparatus and nanobubble-containing liquid producing method'20128,205,277'Manufacturing method for micro-nano bubble bathtub water and micro-nano bubble bathtub'20128,136,800'Device and method for increasing blood flow and insulin-like growth factor'20128,057,676'Drainage water-treating method'20118,043,848'Biological reaction method and bioreactor'20117,914,677'Water treatment apparatus and water treatment method'20117,803,272'Water treatment system'20107,713,410'Wastewater treatment apparatus'20107,691,268'Waste gas/wastewater treatment equipment and method of treating waste gas/wastewater'20107,662,288'Water treatment method and water treatment system'20107,641,802'Wastewater treatment method and wastewater treatment equipment'20107,641,798'Waste water treatment method and waste water treatment apparatus'20107,632,400'Water treatment equipment'20097,628,912'Manufacturing device and application device for liquid containing micro-nano bubbles'20097,625,484'Water treatment apparatus'20097,578,942'Wastewater treatment equipment and method of wastewater treatment'20097,575,684'Waste water treatment apparatus and waste water treatment method'20097,485,232'Water treatment method and water treatment apparatus'20097,329,341'Wastewater treatment device'20087,294,268'Metal containing waste water treatment method and metal containing waste water treatment equipment'20076,896,800'Metal containing waste water treatment method and metal containing waste water treatment equipment'20056,824,684'Wastewater treatment method and apparatus'20046,776,903'System for waste water treatment capable of saving energy and reducing suspended solids'20046,743,353'Method and apparatus for neutralizing alkaline wastewater without using mineral acids'20046,638,427'Waste water treatment method being able to treat surface active agent, nitrogen, hydrogen peroxide and phosphor with high efficiency'20036,630,070'Wastewater treatment method and wastewater treatment equipment for recycling reactants and unreacted chemicals'20036,572,771'Waste water treatment method'20036,479,874'Semiconductor memory device having multilevel memory cell and method of manufacturing the same'20026,464,874'Waste water treatment method and waste water treatment apparatus'20026,423,228'Treating fluorine waste water containing organic matter, phosphor and hydrogen peroxide'20026,413,417'Waste water treatment apparatus'20026,375,837'Waste water treatment method being able to treat surface active agent, nitrogen, hydrogen peroxide and phosphor with high efficiency and equipment therefor'20026,344,142'Waste water treatment method and apparatus'20026,337,810'Semiconductor memory device and method for reading data'20026,261,456'Waste water treatment method and waste water treatment equipment capable of treating waste water containing fuluorine, nitrogen and organic matter'20016,262,925'Semiconductor memory device with improved error correction'20016,228,264'Method and apparatus for biologically treating waste water containing fluorine'20016,228,267'Waste water treatment method and equipment being able to economically treat both a waste water and an exhaust gas respectively containing fluorine and organic matter'20016,217,765'Waste water treatment method and waste water treatment equipment capable of treating fluorine waste water containing organic matter, phosphor and hydrogen peroxide'20016,177,005'System for producing ultrapure water having a TOC density of no more than 0.5 ppb'20016,063,279'Waste water treatment method and equipment being able to treat hydrogen peroxide, phosphorus, fluorine and organic-matters with high efficiency'20006,056,876'Method and apparatus for wastewater treatment'20006,049,481'Multiple-valued mask programmable read only memory semiconductor device with improved word level generator'20005,895,576'Method and apparatus for wastewater treatment by chemical reaction of reactive filler and propagated microorganisms'19995,868,934'Method and apparatus for organic wastewater treatment capable of preventing decrease in permeation efficiency of submerged membrane without dilution'19995,849,194'Apparatus and method for treating waste water both chemically and biologically utilizing reaction fillers'19985,804,076'Method for treatment of waste water and/or exhaust gases containing flourine and surface active agents'19985,788,838'Ultrapure water production system having pretreatment system for performing both anaerobic and aerobic organism treatments'19985,790,450'Semiconductor memory device having bit lines widely spaced without sacrifice of narrow pitch of source/drain lines of memory cells'19985,772,891'Water treating method for treating waste water by using ion exchange resin'19985,707,514'Water treating method and apparatus treating waste water by using ion exchange resin'19985,702,594'Apparatus for treatment of waste water and/or exhaust gases containing fluorine and surface active agents'19975,702,604'Apparatus and method for waste water treatment utilizing granular sludge'19975,676,836'Method for waste water treatment using charcoal biologically activated'19975,632,885'Hydrogen peroxide removal equipment capable of treating both waste water and waste gas'19975,625,586'Semiconductor memory having a plurality of memory banks and sub-bit lines which are connected to a main bit line via MOS transistors whose gates are commonly connected to a selection line'19975,599,443'Apparatus for waste water treatment using charcoal biologically activated'19975,580,458'Method for waste water treatment using calcium carbonate mineral and microorganisms in combination'19965,578,214'Apparatus and method for waste water treatment utilizing aerobic and anaerobic microorganisms and capable of exhaust gas treatment'19965,480,537'Apparatus for waste water treatment using calcium carbonate mineral and microorganisms in combination'19965,423,988'Method and apparatus for treating developer-containing waste water at multiple biological treatment stages'19955,354,517'Process for the preparation of substrates for optical disk'19945,035,802'Membrane filter material having excellent organic solvent resistance, method for formation of membrane filter and process for preparation of bismaleimide polymer to be used for membrane filter'19914,983,717'Membrane filter material having excellent organic solvent resistance, method for formation of membrane filter and process for preparation of bismaleimide polymer to be used for membrane filter'19914,513,049'Electret article'1985

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985–1994Patents assigned to MITSUI PETROCHEMICAL IND (4)· patent assignee history
1991Based in Chiba, JP· patent location history
1994–2002Based in Tokyo, JP· patent location history
1995–2012Patents assigned to SHARP KK (52)· patent assignee history
1995–2012Based in Hiroshima, JP· patent location history
1997–2002Patents assigned to NEC CORP (6)· patent assignee history
2011–2012Patents assigned to CHUHJOH KAZUMI (4)· patent assignee history
2011–2012Patents assigned to YAMASAKI KAZUYUKI (4)· patent assignee history
2012–2019Based in Osaka, JP· patent location history
2021Based in Naka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHARP KK521995–2012
NEC CORP61997–2002
CHUHJOH KAZUMI42011–2012
MITSUI PETROCHEMICAL IND41985–1994
YAMASAKI KAZUYUKIself42011–2012
Locations
LocationPatentsSpan
Hiroshima, JP531995–2012
Tokyo, JP71994–2002
Osaka, JP22012–2019
Chiba, JP21991
Naka, JP12021