Inventor

Sukeyoshi Tsunekawa

Inventor

Iruma, JP

Overview

1983–2010

Patent span

Electricity

Primary field (CPC H)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%

H10DInorganic electric semiconductor devices14%

C23CCoating metallic material10%

C23FNon-mechanical removal of metallic material from surface9%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%

C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis7%

C03CChemical composition of glasses, glazes or vitreous enamels5%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%

H10BElectronic memory devices5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1983–2010Patents assigned to HITACHI LTD (16)· patent assignee history

1983Based in Hachioji, JP· patent location history

1986–1996Based in Tokorozawa, JP· patent location history

1998Patents assigned to HITACHI MICROCOMPUTER SYST (1)· patent assignee history

1998–2010Based in Iruma, JP· patent location history

2003Based in Tokyo, JP· patent location history

2006–2007Patents assigned to RENESAS TECH CORP (2)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations