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Inventor

Wen-Shan Wei

Inventor
Taipei, TW

Overview

3→
Patents
2000–2003
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B08Bprimary
B08BCleaning in general17%
C23CCoating metallic material17%
H01JElectric discharge tubes or discharge lamps17%
H10BElectronic memory devices17%
H10DInorganic electric semiconductor devices17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
PatentTitleYear
6,545,245'Method for dry cleaning metal etching chamber'20036,281,133'Method for forming an inter-layer dielectric layer'20016,133,091'Method of fabricating a lower electrode of capacitor'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2003Patents assigned to UNITED MICROELECTRONICS CORP (3)· patent assignee history
2000Patents assigned to UNITED SILICON INC (1)· patent assignee history
2000–2003Based in Taipei, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
UNITED MICROELECTRONICS CORP32000–2003
UNITED SILICON INC12000
Locations
LocationPatentsSpan
Taipei, TW32000–2003