Inventor
Kenneth Edward Hrdina
Inventor
Horseheads, NY, US
Overview
Patents· 52 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C03Bprimary
C03BManufacture, shaping, or supplementary processes25%
C03CChemical composition of glasses, glazes or vitreous enamels20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
B82YSpecific uses or applications of nanostructures6%
G02BOptical elements, systems or apparatus5%
Y02PClimate change mitigation technologies in the production or processing of goods4%
Y10TTechnical subjects covered by former us classification4%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy3%
G21KHandling of particles or ionising radiation not otherwise provided for2%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution2%
PatentTitleYear
11,111,172Basic additives for silica soot compacts and methods for forming optical quality glass202111,028,006Ultralow expansion titania-silica glass202110,781,129Fusing glass articles202010,329,184Ultralow expansion titania-silica glass201910,017,413Doped silica-titania glass having low expansivity and methods of making the same20189,932,261Doped ultra-low expansion glass and methods for annealing the same20189,822,030'Ultralow expansion titania-silica glass'20179,611,169'Doped ultra-low expansion glass and methods for making the same'20179,580,350'High hydroxyl TiO2-SiO2 glass'20179,382,150'Boron-doped titania-silica glass having very low CTE slope'20168,987,155'Niobium doped silica titania glass and method of preparation'20158,901,019'Very low CTE slope doped silica-titania glass'20148,713,969'Tuning Tzc by the annealing of ultra low expansion glass'20148,596,094'Synthetic silica glass with uniform fictive temperature'20138,541,325'Low expansivity, high transmission titania doped silica glass'20138,268,740'Halide free glasses having low OH, OD concentrations'20128,263,511'High purity fused silica with low absolute refractive index'20128,261,578'Hydrogen loading of near net shape optics'20128,047,023'Method for producing titania-doped fused silica glass'20118,021,755'Low thermal expansion glass for EUVL applications'20118,012,894'Glasses having low OH, OD levels'20117,994,083'Fused silica glass and method for making the same'20117,939,457'Low expansion glass material having low expansivity gradient'20117,928,026'Synthetic silica material with low fluence-dependent-transmission and method of making the same'2011RE041220'Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements'20107,589,040'Doped silica glass articles and methods of forming doped silica glass boules and articles'20097,534,733'Synthetic silica glass optical material having high resistance to laser induced damage'20097,506,522'High refractive index homogeneity fused silica glass and method of making same'20097,506,521'High transmission synthetic silica glass and method of making same'2009RE040586'Reduced striae extreme ultra violet elements'20087,155,936'Doped silica glass articles and methods of forming doped silica glass boules and articles'20077,053,017'Reduced striae extreme ultraviolet elements'20066,997,015'EUV lithography glass structures formed by extrusion consolidation process'20066,988,377'Method for making extreme ultraviolet lithography structures'20066,988,378'Light weight porous structure'20066,931,097'Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements'20056,832,493'High purity glass bodies formed by zero shrinkage casting'20046,829,908'Fabrication of inclusion free homogeneous glasses'20046,764,619'Solid freeform fabrication of lightweight lithography stage'20046,606,883'Method for producing fused silica and doped fused silica glass'20036,576,380'Extreme ultraviolet soft x-ray projection lithographic method and mask devices'20036,548,142'Silica glass honeycomb structure from silica soot extrusion'20036,542,224'Silica-based light-weight EUV lithography stages'20036,479,129'Titanium-coating silica glass honeycomb structure from silica soot extrusion'20026,468,374'Method of making silica glass honeycomb structure from silica soot extrusion'20026,465,272'Extreme ultraviolet soft x-ray projection lithographic method and mask devices'20026,387,511'Light weight porous structure'20026,093,234'Process for preparing submicron/nanosize ceramic powders from precursors incorporated within a polymeric foam'20005,338,334'Process for preparing submicron/nanosize ceramic powders from precursors incorporated within a polymeric foam'19945,316,555'Molten carbonate fuel cell electrolyte toughening'19945,240,493'Process for preparing submicron/nanosize ceramic powders from precursors incorporated within a polymeric foam'19935,206,095'Carbonate fuel cell anodes'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2000Patents assigned to INST GAS TECHNOLOGY (5)· patent assignee history
1993–2000Based in Glenview, IL, US· patent location history
2002–2021Patents assigned to CORNING INC (47)· patent assignee history
2002–2021Based in Horseheads, NY, US· patent location history
2012–2014Patents assigned to HRDINA KENNETH EDWARD (6)· patent assignee history
2012–2014Patents assigned to DURAN CARLOS (4)· patent assignee history
2012Patents assigned to FIACCO RICHARD MICHAEL (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CORNING INC | 47 | 2002–2021 |
| HRDINA KENNETH EDWARDself | 6 | 2012–2014 |
| INST GAS TECHNOLOGY | 5 | 1993–2000 |
| DURAN CARLOS | 4 | 2012–2014 |
| FIACCO RICHARD MICHAEL | 2 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Horseheads, New York, US | 47 | 2002–2021 |
| Glenview, Illinois, US | 5 | 1993–2000 |