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Inventor

Robert Paul Ebeling

Inventor
Zoetermeer, NL

Overview

1→
Patents
2017
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus25%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
Y10TTechnical subjects covered by former us classification25%
PatentTitleYear
9,715,183'Device, lithographic apparatus, method for guiding radiation and device manufacturing method'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2017Based in Zoetermeer, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12017
Locations
LocationPatentsSpan
Zoetermeer, NL12017