Inventor
Daniel Y. Pai
Inventor
Millbury, MA, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H05KPrinted circuits8%
Y02PClimate change mitigation technologies in the production or processing of goods8%
Y10TTechnical subjects covered by former us classification8%
B82YSpecific uses or applications of nanostructures5%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds5%
C09CTreatment of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties5%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B41MPrinting, duplicating, marking, or copying processes3%
PatentTitleYear
11,021,410Layer-wise agglomerated urea granules20219,875,439'License plate radio electronic identifier'20185,917,024'Acid labile photoactive composition'19995,885,343'Dyed silica pigments and products made from same'19995,871,872'Dye incorporated pigments and products made from same'19995,858,605'Acid labile photoactive composition'19995,719,003'Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers'19985,691,395'Process of making flexible circuits and imaged coatings'19975,648,194'Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether'19975,641,604'Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers'19975,627,010'Photoimageable resist compositions containing photobase generator'19975,384,229'Photoimageable compositions for electrodeposition'19955,366,846'Photoimageable compositions comprising polybutadiene having internal epoxide groups'19945,314,789'Method of forming a relief image comprising amphoteric compositions'19945,262,280'Radiation sensitive compositions'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1997Patents assigned to SHIPLEY CO (5)· patent assignee history
1993–1999Based in Millbury, MA, US· patent location history
1997–1999Patents assigned to SHIPLEY CO LLC (7)· patent assignee history
2018Patents assigned to PAI DANIEL (1)· patent assignee history
2018Patents assigned to RFID INTEGRATED MARKETING CO LTD (1)· patent assignee history
2018Based in Taichung, TW· patent location history
2021Patents assigned to PURDUE RESEARCH FOUNDATION (1)· patent assignee history
2021Based in West Lafayette, IN, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHIPLEY CO LLC | 7 | 1997–1999 |
| SHIPLEY CO | 5 | 1993–1997 |
| PAI DANIELself | 1 | 2018 |
| PURDUE RESEARCH FOUNDATION | 1 | 2021 |
| RFID INTEGRATED MARKETING CO LTD | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Millbury, Massachusetts, US | 13 | 1993–1999 |
| West Lafayette, IN, US | 1 | 2021 |
| Taichung, TW | 1 | 2018 |