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Inventor

Jeewoo Lim

Inventor
Seoul, KR

Overview

3→
Patents
2000–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C08JWorking-up14%
C08LCompositions of macromolecular compounds14%
C30BSingle-crystal growth14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
PatentTitleYear
10,920,024Polysulfide copolymer particle and method of preparing the same20216,454,563'Wafer treatment chamber having thermal reflector'20026,015,758'Method of stripping a wafer of its film with gas injected into a CVD apparatus in which the wafer is disposed'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2002Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
2000Based in Kyungki-do, KR· patent location history
2002Based in Suwon-si, KR· patent location history
2021Patents assigned to SEOUL NAT UNIV R&DB FOUNDATION (1)· patent assignee history
2021Based in Seoul, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD22000–2002
SEOUL NAT UNIV R&DB FOUNDATION12021
Locations
LocationPatentsSpan
Seoul, KR12021
Suwon-si, KR12002
Kyungki-do, KR12000