Inventor
Tetsuyuki Saika
Inventor
Suita, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds31%
C07DHeterocyclic compounds23%
G02BOptical elements, systems or apparatus15%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
G03HHolographic processes or apparatus8%
PatentTitleYear
7,361,432'Composition for hologram-recording material, hologram-recording medium, and process for producing the same'20085,734,065'Thiophene derivative and the polymer thereof and methods for production thereof'19985,484,872'Cyclic sulfide compound, polymerizable compositions for optical products and optical products formed thereof'19965,446,173'Cyclic sulfide compound, polymerizable compositions for optical products and optical products formed thereof'19955,232,574'Polyviologen modified electrode and use thereof'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1996Patents assigned to DAISO CO LTD (3)· patent assignee history
1993–2008Based in Osaka, JP· patent location history
1995–1998Based in Suita, JP· patent location history
1998Patents assigned to JAPAN RES DEV CORP (1)· patent assignee history
2008Patents assigned to NAT INST OF ADVANCED IND SCIEN (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DAISO CO LTD | 3 | 1993–1996 |
| JAPAN RES DEV CORP | 1 | 1998 |
| NAT INST OF ADVANCED IND SCIEN | 1 | 2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suita, JP | 3 | 1995–1998 |
| Osaka, JP | 2 | 1993–2008 |