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Inventor

Shinich Imada

Inventor
Fukushima, JP

Overview

2→
Patents
2011–2012
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
8,309,455'SiH4 soak for low hydrogen SiN deposition to improve flash memory device performance'20127,985,674'SiH4 soak for low hydrogen SiN deposition to improve flash memory device performance'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2012Patents assigned to SPANSION LLC (2)· patent assignee history
2011Based in Aizuwakamatsu, JP· patent location history
2012Patents assigned to IMADA SHINICH (1)· patent assignee history
2012Patents assigned to KIM SUNG JIN (1)· patent assignee history
2012Patents assigned to NGO MINH-VAN (1)· patent assignee history
2012Patents assigned to NICKEL ALEXANDER (1)· patent assignee history
2012Based in Fukushima, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SPANSION LLC22011–2012
IMADA SHINICHself12012
KIM SUNG JIN12012
NGO MINH-VAN12012
NICKEL ALEXANDER12012
Locations
LocationPatentsSpan
Fukushima, JP12012
Aizuwakamatsu, JP12011