Inventor
Xiaochun Chen
Inventor
Nanjing, CN
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C12Nprimary
C12NMicroorganisms or enzymes10%
C12PFermentation or enzyme-using processes to synthesise a desired chemical compound or composition or to separate optical isomers from a racemic mixture10%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
Y02PClimate change mitigation technologies in the production or processing of goods8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
C07CAcyclic or carbocyclic compounds5%
H10KOrganic electric solid-state devices5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
A61KPreparations for medical, dental or toiletry purposes3%
PatentTitleYear
11,117,899[1,2,4]triazolo[1,5-c]pyrimidine derivative as A202111,066,411[1,2,4]triazolo[1,5-c]pyrimidine derivative as A202111,017,291Training with adaptive runtime and precision profiling202110,144,925Preparation method of yeast cell immobilization medium and application thereof20189,918,972'Treatment of leukemia with artemisinin derivatives and combinations with other antineoplastic agents'20189,512,420'Use of N-acetylneuraminic acid aldolase in catalytic synthesis of N-acetylneuraminic acid'20169,416,385'Method for microbial production of cyclic adenosine 3′, 5′-monophosphate'20169,249,433'Clostridium acetobutylicum and application thereof'20169,108,897'Method for desorbing and regenerating butanol-adsorbing hydrophobic macroporous polymer adsorbent'20158,766,019'Method for separating butanol'20147,496,167'Storage efficient sliding window sum'20097,141,338'Sub-resolution sized assist features'20066,815,367'Elimination of resist footing on tera hardmask'20046,713,236'Lithography method for preventing lithographic exposure of peripheral region of semiconductor wafer'20046,579,564'Process for fabricating polarized organic photonics devices'20036,541,387'Process for implementation of a hardmask'20036,489,044'Process for fabricating polarized organic photonics devices, and resultant articles'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2003Based in Parsippany, NJ, US· patent location history
2003–2004Based in Hopewell Junction, NY, US· patent location history
2009–2021Based in Shanghai, CN· patent location history
2014–2018Patents assigned to NANJING UNIVERSITY OF TECHNOLOGY (5)· patent assignee history
2014–2016Patents assigned to BAI JIANXIN (4)· patent assignee history
2014–2016Patents assigned to CHEN XIAOCHUN (4)· patent assignee history
2014–2016Patents assigned to CHEN YONG (4)· patent assignee history
2014–2016Patents assigned to WU JINGLAN (4)· patent assignee history
2014–2018Based in Nanjing, CN· patent location history
2018Based in Timonium, MD, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NANJING UNIVERSITY OF TECHNOLOGY | 5 | 2014–2018 |
| BAI JIANXIN | 4 | 2014–2016 |
| CHEN XIAOCHUNself | 4 | 2014–2016 |
| CHEN YONG | 4 | 2014–2016 |
| WU JINGLAN | 4 | 2014–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nanjing, CN | 6 | 2014–2018 |
| Shanghai, CN | 4 | 2009–2021 |
| Hopewell Junction, New York, US | 3 | 2003–2004 |
| Parsippany, New Jersey, US | 2 | 2002–2003 |
| Timonium, Maryland, US | 1 | 2018 |