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Inventor

Marco Le Kluse

Inventor
Maassluis, NL

Overview

6→
Patents
2005–2013
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices55%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%
Y10TTechnical subjects covered by former us classification9%
PatentTitleYear
8,476,167'Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus'20137,528,935'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20097,245,357'Lithographic apparatus and device manufacturing method'20077,187,433'Electrostatic clamp assembly for a lithographic apparatus'20077,041,989'Lithographic apparatus and device manufacturing method'20066,897,945'Lithographic apparatus and device manufacturing method'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2013Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2005–2013Based in Maassluis, NL· patent location history
2006Based in Maassluls, NL· patent location history
2013Patents assigned to HAM ERIK LEONARDUS (1)· patent assignee history
2013Patents assigned to HOPMAN JAN (1)· patent assignee history
2013Patents assigned to LE KLUSE MARCO (1)· patent assignee history
2013Patents assigned to LEIJTENS JOHANNES ADRIANUS PETRUS (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV62005–2013
HAM ERIK LEONARDUS12013
HOPMAN JAN12013
LE KLUSE MARCOself12013
LEIJTENS JOHANNES ADRIANUS PETRUS12013
Locations
LocationPatentsSpan
Maassluis, NL52005–2013
Maassluls, NL12006