LexDanaLexDanabeta
Inventor

Danielle LOI

Inventor
US

Overview

3→
Patents
2022–2024
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing43%
B23BTurning14%
B24DTools for grinding, buffing or sharpening14%
B26DCutting14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
PatentTitleYear
12,076,877Polishing platens and polishing platen manufacturing methods202411,919,120Polishing system with contactless platen edge control202411,389,925Offset head-spindle for chemical mechanical polishing2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2024Patents assigned to APPLIED MATERIALS INC (3)· patent assignee history
2022–2024Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC32022–2024
Locations
LocationPatentsSpan
US32022–2024