Inventor

Satoru Oishi

Inventor

Tochigi, JP

Overview

1999–2021

Patent span

Physics

Primary field (CPC G)

Patents· 34 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%

G05BControl or regulating systems in general6%

G06TImage data processing or generation, in general6%

Y02PClimate change mitigation technologies in the production or processing of goods6%

A61BDiagnosis4%

G01BMeasuring length, thickness or similar linear dimensions3%

H01JElectric discharge tubes or discharge lamps3%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light1%

PatentTitleYear

D0924137Electrode plate2021 10,420,461Image generating apparatus, image generating method, and storage medium2019 9,606,460'Lithography apparatus, and method of manufacturing article'2017 9,001,387'Drawing apparatus, data processing method, and method of manufacturing article that transform partially overlapping regions using different transformation rules'2015 8,976,337'Method of measuring mark position and measuring apparatus'2015 8,532,366'Position detecting method'2013 8,097,473'Alignment method, exposure method, pattern forming method, and exposure apparatus'2012 8,089,612'Position detection apparatus, position detection method, exposure apparatus, and device fabrication method'2012 7,983,472'Position detecting method'2011 7,952,725'Surface shape measurement apparatus and exposure apparatus'2011 7,916,271'Apparatus and method for specifying correlation, exposure apparatus, and device manufacturing method'2011 7,865,328'Position detecting method and apparatus'2011 7,710,543'Scanning exposure apparatus and device manufacturing method'2010 7,443,493'Transfer characteristic calculation apparatus, transfer characteristic calculation method, and exposure apparatus'2008 7,385,700'Management system, apparatus, and method, exposure apparatus, and control method therefor'2008 7,373,213'Management system and apparatus, method therefor, and device manufacturing method'2008 7,352,891'Position detecting method'2008 7,313,873'Surface position measuring method, exposure apparatus, and device manufacturing method'2008 7,247,868'Position detection method and apparatus'2007 7,173,716'Alignment apparatus, exposure apparatus using the same, and method of manufacturing devices'2007 7,148,973'Position detecting method and apparatus, exposure apparatus and device manufacturing method'2006 7,110,116'Alignment apparatus, exposure apparatus using same, and method of manufacturing devices'2006 7,075,618'Apparatus control system, apparatus control method, semiconductor exposure apparatus, semiconductor exposure apparatus control method and semiconductor device manufacturing method'2006 7,067,826'Position detection method and apparatus'2006 7,069,104'Management system, management apparatus, management method, and device manufacturing method'2006 7,035,759'Position detecting method and apparatus'2006 7,010,380'Management system, management method and apparatus, and management apparatus control method'2006 6,992,780'Position detecting method and apparatus, exposure apparatus and device manufacturing method'2006 6,992,767'Management system, apparatus, and method, exposure apparatus, and control method therefor'2006 6,914,666'Method and system for optimizing parameter value in exposure apparatus and exposure apparatus and method'2005 6,785,583'Management system and apparatus, method therefor, and device manufacturing method'2004 6,412,978'X-ray diagnostic apparatus'2002 6,196,715'X-ray diagnostic system preferable to two dimensional x-ray detection'2001 5,910,843'Positioning apparatus and method thereof, and exposure apparatus'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2019Patents assigned to CANON KK (31)· patent assignee history

1999–2019Based in Utsunomiya, JP· patent location history

2001–2002Patents assigned to TOSHIBA KK (2)· patent assignee history

2001–2002Based in Otawara, JP· patent location history

2004–2011Based in Tochigi, JP· patent location history

2012–2015Patents assigned to OISHI SATORU (4)· patent assignee history

2012Patents assigned to INA HIDEKI (1)· patent assignee history

2012Patents assigned to MATSUMOTO TAKAHIRO (1)· patent assignee history

2021Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	31	1999–2019
OISHI SATORUself	4	2012–2015
TOSHIBA KK	2	2001–2002
INA HIDEKI	1	2012
MATSUMOTO TAKAHIRO	1	2012

Locations

Location	Patents	Span
Tochigi, JP	17	2004–2011
Utsunomiya, JP	14	1999–2019
Otawara, JP	2	2001–2002
Shanghai, CN	1	2021