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Inventor

Kazushi Gouroku

Inventor
Niigata, JP

Overview

2→
Patents
2003–2005
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
6,881,864'Production method of xylylenediamine'20056,602,654'Developing solution for a photoresist and a method for developing the photoresist'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2005Patents assigned to MITSUBISHI GAS CHEMICAL CO (2)· patent assignee history
2003–2005Based in Niigata, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO22003–2005
Locations
LocationPatentsSpan
Niigata, JP22003–2005