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Inventor

Kyouhei Nomura

Inventor
Tokyo, JP

Overview

1→
Patents
2016
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B22Fprimary
B22FWorking metallic powder33%
C22CAlloys33%
C23CCoating metallic material33%
PatentTitleYear
9,410,250'Discharge surface treatment electrode and method of manufacturing the same'2016

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016Patents assigned to HASEGAWA MASANOBU (1)· patent assignee history
2016Patents assigned to IHI CORP (1)· patent assignee history
2016Patents assigned to KURITA SATOSHI (1)· patent assignee history
2016Patents assigned to NOMURA KYOUHEI (1)· patent assignee history
2016Patents assigned to SHIMODA YUKIHIRO (1)· patent assignee history
2016Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HASEGAWA MASANOBU12016
IHI CORP12016
KURITA SATOSHI12016
NOMURA KYOUHEIself12016
SHIMODA YUKIHIRO12016
Locations
LocationPatentsSpan
Tokyo, JP12016