Inventor
Nobuo Uotani
Inventor
Chiba, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Dprimary
C09DCoating compositions, e.g. paints, varnishes or lacquers26%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
C09GPolishing compositions10%
C09KMaterials for miscellaneous applications, not provided for elsewhere10%
B41MPrinting, duplicating, marking, or copying processes6%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
H01BCables6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
B41JTypewriters3%
PatentTitleYear
7,018,455'Ink composition, recording medium, ink jet recording method, and printed matter'20066,989,054'Ink jet white ink and titanium dioxide slurry therefor'20066,952,025'Semiconductor light-emitting device'20056,844,263'LSI device polishing composition and method for producing LSI device'20056,811,597'Ink composition, recording medium, inkjet recording method, and recording'20046,761,759'Ink composition, ink jet recording method and recorded matter'20046,676,735'Aqueous ink'20046,547,843'LSI device polishing composition and method for producing LSI device'20036,498,222'Water resistance imparter, ink composition, reactive fluid, and method of ink-jet recording with two fluids'20026,362,348'Additive for inkjet printing, recording solution, method for preventing discoloration and fading of image, and recording sheet'20026,337,301'Photocatalytic metal oxide composition, thin film, and composite'20026,299,659'Polishing material composition and polishing method for polishing LSI devices'20015,491,203'Polyorganosiloxane and process for producing the same'19964,954,590'Preparation of polymer having isoindole structures'19904,833,231'Polymer having isoindole structure'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2005Patents assigned to SHOWA DENKO KK (8)· patent assignee history
1989–1990Based in Oita, JP· patent location history
1996Based in Kanagawa, JP· patent location history
2001–2006Based in Chiba, JP· patent location history
2002–2006Patents assigned to SEIKO EPSON CORP (7)· patent assignee history
2002Based in Ichihara, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHOWA DENKO KK | 8 | 1989–2005 |
| SEIKO EPSON CORP | 7 | 2002–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiba, JP | 11 | 2001–2006 |
| Oita, JP | 2 | 1989–1990 |
| Ichihara, JP | 1 | 2002 |
| Kanagawa, JP | 1 | 1996 |