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Inventor

KUO-SHIH LIU

Inventor
US

Overview

3→
Patents
2021–2023
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps27%
G01BMeasuring length, thickness or similar linear dimensions18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H01LSemiconductor devices18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
PatentTitleYear
11,720,030Low dose charged particle metrology system202311,430,631Methods of inspecting samples with multiple beams of charged particles202211,175,590Low dose charged particle metrology system2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2023Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2021–2023Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32021–2023
Locations
LocationPatentsSpan
US32021–2023