Inventor
Remko Wakker
Inventor
Eindhoven, NL
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
G01DMeasuring not specially adapted for a specific variable11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
PatentTitleYear
9,019,476'Lithographic apparatus and device manufacturing method'20157,978,308'Lithographic apparatus and device manufacturing method'20117,830,495'Lithographic apparatus and position sensor'20107,808,612'Lithographic apparatus and method for masking a substrate'20107,777,863'Lithographic apparatus with mask to prevent exposure of peripheral exposure region of substrate'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2015Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2010–2015Based in Eindhoven, NL· patent location history
2015Patents assigned to BOEKHOLT FRANCISCUS JOHANNES MARIA (1)· patent assignee history
2015Patents assigned to COMPEN RENE THEODORUS PETRUS (1)· patent assignee history
2015Patents assigned to EL BOUCHAIBI MAJID (1)· patent assignee history
2015Patents assigned to HOUBEN MARTIJN (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2010–2015 |
| BOEKHOLT FRANCISCUS JOHANNES MARIA | 1 | 2015 |
| COMPEN RENE THEODORUS PETRUS | 1 | 2015 |
| EL BOUCHAIBI MAJID | 1 | 2015 |
| HOUBEN MARTIJN | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 5 | 2010–2015 |