Inventor
RICHARD A. GOTTSCHO
Inventor
US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01LSemiconductor devices10%
B01DSeparation5%
C23CCoating metallic material5%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
G06FElectric digital data processing5%
G06NComputing arrangements based on specific computational models5%
G06TImage data processing or generation, in general5%
H01JElectric discharge tubes or discharge lamps5%
PatentTitleYear
12,510,825Photoresist development with halide chemistries202512,510,826Photoresist development with halide chemistries202512,217,945Sorption chamber walls for semiconductor equipment202512,105,422Photoresist development with halide chemistries202411,520,953Predicting etch characteristics in thermal etching and atomic layer etching202211,263,737Defect classification and source analysis for semiconductor equipment202211,209,729Vacuum-integrated hardmask processes and apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to LAM RES CORP (7)· patent assignee history
2021–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 7 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 7 | 2021–2025 |