Inventor
Ivan Lalovic
Inventor
San Francisco, CA, US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices53%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light28%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light6%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
B82YSpecific uses or applications of nanostructures3%
G02BOptical elements, systems or apparatus3%
PatentTitleYear
11,073,423Hyperspectral sensing system and processing methods for hyperspectral data202110,794,888Hyperspectral sensing system202010,036,960Wafer-based light source parameter control20189,715,180'Wafer-based light source parameter control'20179,709,897'Polarization control of pulsed light beam'20178,520,186'Active spectral control of optical source'20138,170,078'Laser system'20127,999,915'Laser system'20117,885,309'Laser system'20117,741,012'Method for removal of immersion lithography medium in immersion lithography processes'20107,382,815'Laser spectral engineering for lithographic process'20087,298,770'Laser spectral engineering for lithographic process'20077,139,301'Laser spectral engineering for lithographic process'20067,087,907'Detection of contamination in imaging systems by fluorescence and/or absorption spectroscopy'20067,081,956'Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging system'20067,014,966'Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems'20066,984,475'Extreme ultraviolet (EUV) lithography masks'20066,977,717'Method and device for determining projection lens pupil transmission distribution and illumination intensity distribution in photolithographic imaging system'20056,853,653'Laser spectral engineering for lithographic process'20056,829,040'Lithography contrast enhancement technique by varying focus with wavelength modulation'20046,671,294'Laser spectral engineering for lithographic process'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2012Patents assigned to CYMER INC (8)· patent assignee history
2003–2008Based in San Diego, CA, US· patent location history
2004–2010Patents assigned to ADVANCED MICRO DEVICES INC (7)· patent assignee history
2004–2006Based in Mountain View, CA, US· patent location history
2006–2018Based in San Francisco, CA, US· patent location history
2013–2018Patents assigned to Cymer LLC (4)· patent assignee history
2013Patents assigned to BENDIK JOSEPH J (1)· patent assignee history
2020–2021Patents assigned to FLYING GYBE INC (2)· patent assignee history
2020–2021Based in Portland, OR, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CYMER INC | 8 | 2003–2012 |
| ADVANCED MICRO DEVICES INC | 7 | 2004–2010 |
| Cymer LLC | 4 | 2013–2018 |
| FLYING GYBE INC | 2 | 2020–2021 |
| BENDIK JOSEPH J | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Francisco, California, US | 9 | 2006–2018 |
| Mountain View, California, US | 6 | 2004–2006 |
| San Diego, California, US | 4 | 2003–2008 |
| Portland, OR, US | 2 | 2020–2021 |