Inventor
Koichi Ayama
Inventor
Tokyo, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds22%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium15%
C08LCompositions of macromolecular compounds12%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients10%
C09DCoating compositions, e.g. paints, varnishes or lacquers10%
H01LSemiconductor devices10%
H10HInorganic light-emitting semiconductor devices having potential barriers10%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C04BLime, magnesia2%
C09KMaterials for miscellaneous applications, not provided for elsewhere2%
PatentTitleYear
9,593,240'Thermosetting resin composition'20179,512,273'Thermosetting resin composition'20169,115,243'Organosilicon compound, thermosetting resin composition containing the organosilicon compound, hardening resin and encapsulation material for optical semiconductor'20158,987,358'Compound including organopolysiloxane or silsesquioxane skeleton having isocyanuric skeleton, epoxy group and SiH group, thermosetting resin composition containing the compound as adhesion-imparting agent, hardened material and sealing agent for optical semiconductor'20158,946,357'Organosilicon compound, thermosetting resin composition containing the organosilicon compound, hardening resin and encapsulation material for optical semiconductor'20156,107,504'Ester group-containing siloxane compound, and its preparation method'20006,107,505'Process for production of polyorganosiloxane'20005,952,444'Polyurethane coating resin composition'19995,831,110'Fluorine-containing siloxane compound and process for production thereof'19984,937,304'New polysilazane and process for production of the same'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1990–2000Patents assigned to CHISSO CORP (5)· patent assignee history
1990Based in Minamata, JP· patent location history
1998–2000Based in Kumamoto, JP· patent location history
2015–2017Patents assigned to JNC CORP (5)· patent assignee history
2015Patents assigned to AYAMA KOICHI (2)· patent assignee history
2015Patents assigned to KAWABATA KIICHI (2)· patent assignee history
2015Patents assigned to MATSUO TAKASHI (2)· patent assignee history
2015–2017Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CHISSO CORP | 5 | 1990–2000 |
| JNC CORP | 5 | 2015–2017 |
| AYAMA KOICHIself | 2 | 2015 |
| KAWABATA KIICHI | 2 | 2015 |
| MATSUO TAKASHI | 2 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 5 | 2015–2017 |
| Kumamoto, JP | 4 | 1998–2000 |
| Minamata, JP | 1 | 1990 |