Inventor

Koji Eriguchi

Inventor

Osaka, JP

Overview

25→

Patents

1997–2008

Patent span

Electricity

Primary field (CPC H)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%

B82YSpecific uses or applications of nanostructures6%

G02BOptical elements, systems or apparatus6%

G11CStatic stores6%

H01HElectric switches6%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation6%

H10HInorganic light-emitting semiconductor devices having potential barriers6%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%

Y02PClimate change mitigation technologies in the production or processing of goods6%

PatentTitleYear

7,432,556'Semiconductor device with dummy conductors'2008 6,974,987'Semiconductor device'2005 6,849,470'APPARATUS AND METHOD FOR OPTICAL EVALUATION, APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF CONTROLLING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE'2005 6,750,976'Device for manufacturing semiconductor device and method of manufacturing the same'2004 6,734,451'Aggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the same'2004 6,734,069'Method of forming a high dielectric constant insulating film and method of producing semiconductor device using the same'2004 6,727,108'APPARATUS AND METHOD FOR OPTICAL EVALUATION, APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF CONTROLLING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE'2004 6,720,790'Method and apparatus for evaluating insulating film'2004 6,695,947'Device for manufacturing semiconductor device and method of manufacturing the same'2004 6,583,640'Method and apparatus for evaluating insulating film'2003 6,580,091'APPARATUS AND METHOD FOR OPTICAL EVALUATION, APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF CONTROLLING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE'2003 6,489,629'Aggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the same'2002 6,469,535'Method for examining semiconductor substrate, and method for controlling fabrication process of semiconductor devices'2002 6,395,563'Device for manufacturing semiconductor device and method of manufacturing the same'2002 6,372,082'Method and apparatus for semiconductor device fabrication'2002 6,177,291'Method of making aggregate of semiconductor micro-needles'2001 6,113,733'Apparatus and method for optical evaluation, apparatus and method for manufacturing semiconductor device, method of controlling apparatus for manufacturing semiconductor device, and semiconductor device'2000 6,087,197'Aggregate of semiconductor micro-needles and method of manufacturing the same, and semiconductor apparatus and method of manufacturing the same'2000 6,069,090'Method and apparatus for semiconductor device fabrication'2000 6,033,928'Method of manufacturing aggregate of semiconductor micro-needles'2000 5,985,032'Semiconductor manufacturing apparatus'1999 5,903,031'MIS device, method of manufacturing the same, and method of diagnosing the same'1999 5,898,207'Method for making a semiconductor device'1999 5,897,378'Method of monitoring deposit in chamber, method of plasma processing, method of dry-cleaning chamber, and semiconductor manufacturing apparatus'1999 5,650,336'Method of presuming life time of semiconductor device'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (25)· patent assignee history

1997–2005Based in Osaka, JP· patent location history

2002–2004Based in Shiga, JP· patent location history

2003–2004Based in Kusatsu, JP· patent location history

2005–2008Based in Ritto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD	25	1997–2008

Locations

Location	Patents	Span
Osaka, JP	17	1997–2005
Shiga, JP	4	2002–2004
Ritto, JP	2	2005–2008
Kusatsu, JP	2	2003–2004