Inventor
Kazuyuki Ikenaga
Inventor
Tokyo, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H01LSemiconductor devices15%
H05HPlasma technique7%
C23CCoating metallic material5%
C23FNon-mechanical removal of metallic material from surface5%
B08BCleaning in general2%
F04BPositive-displacement machines for liquids2%
G01RMeasuring electric variables2%
G05DSystems for controlling or regulating non-electric variables2%
PatentTitleYear
11,107,694Method for releasing sample and plasma processing apparatus using same202110,886,106Plasma processing apparatus and method for venting a processing chamber to atmosphere202110,490,412Method for releasing sample and plasma processing apparatus using same201910,395,935Plasma processing apparatus and plasma processing method20199,941,133Plasma processing apparatus and plasma processing method20189,607,874'Plasma processing apparatus'20178,680,466'Electron microscope, and specimen holding method'20148,024,831'Cleaning method'20118,006,340'Cleaning apparatus'20117,771,607'Plasma processing apparatus and plasma processing method'20107,601,241'Plasma processing apparatus and plasma processing method'20096,911,157'Plasma processing method and apparatus using dynamic sensing of a plasma environment'20056,850,012'Plasma processing apparatus'20056,793,768'Plasma-assisted processing apparatus'20046,716,301'Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2010Patents assigned to HITACHI LTD (5)· patent assignee history
2004–2005Based in Chiyoda-ku, JP· patent location history
2005–2021Patents assigned to HITACHI HIGH TECH CORP (11)· patent assignee history
2009–2010Based in Ibaraki, JP· patent location history
2011Based in Hachioji, JP· patent location history
2014Patents assigned to HITACHI HIGH TECHNOLOGIES COPORATION (1)· patent assignee history
2014Patents assigned to IKENAGA KAZUYUKI (1)· patent assignee history
2014Patents assigned to KANNO SEIICHIRO (1)· patent assignee history
2014Based in Tachikawa, JP· patent location history
2017–2021Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 11 | 2005–2021 |
| HITACHI LTD | 5 | 2004–2010 |
| HITACHI HIGH TECHNOLOGIES COPORATION | 1 | 2014 |
| IKENAGA KAZUYUKIself | 1 | 2014 |
| KANNO SEIICHIRO | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 6 | 2017–2021 |
| Chiyoda-ku, JP | 3 | 2004–2005 |
| Hachioji, JP | 2 | 2011 |
| Ibaraki, JP | 2 | 2009–2010 |
| Tachikawa, JP | 1 | 2014 |