Inventor
Tsuneaki Kamei
Inventor
Kanagawa, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material15%
H01JElectric discharge tubes or discharge lamps15%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
B41JTypewriters5%
H01CResistors5%
H05BElectric heating5%
H05KPrinted circuits5%
H10NElectric solid-state devices not otherwise provided for5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
PatentTitleYear
5,942,185'Lead-free solder used for connecting electronic parts on organic substrate and electronic products made using same'19995,867,809'Electric appliance, printed circuit board, remained life estimation method, and system thereof'19994,963,239'Sputtering process and an apparatus for carrying out the same'19904,806,725'Circuit substrate and thermal printing head using the same'19894,724,060'Sputtering apparatus with film forming directivity'19884,610,770'Method and apparatus for sputtering'19864,610,774'Target for sputtering'19864,517,444'Thermal printhead'19854,460,494'Resistor'19844,444,635'Film forming method'19844,405,435'Apparatus for performing continuous treatment in vacuum'19834,401,539'Sputtering cathode structure for sputtering apparatuses, method of controlling magnetic flux generated by said sputtering cathode structure, and method of forming films by use of said sputtering cathode structure'19834,343,986'Thermal printhead'19824,161,431'Process for producing thin film resistor'19794,042,726'Selective oxidation method'19773,997,378'Method of manufacturing a semiconductor device utilizing monocrystalline-polycrystalline growth'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1999Patents assigned to HITACHI LTD (16)· patent assignee history
1976–1977Based in Mitaka, JP· patent location history
1979Based in Tokyo, JP· patent location history
1982–1999Based in Kanagawa, JP· patent location history
1983Patents assigned to ANELVA CORP (1)· patent assignee history
1999Based in Naka-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 16 | 1976–1999 |
| ANELVA CORP | 1 | 1983 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 12 | 1982–1999 |
| Mitaka, JP | 2 | 1976–1977 |
| Naka-gun, JP | 1 | 1999 |
| Tokyo, JP | 1 | 1979 |