Inventor
Akira Doi
Inventor
Hitachinaka, JP
Overview
Patents· 39 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps13%
C23CCoating metallic material12%
H02KDynamo-electric machines6%
G02BOptical elements, systems or apparatus5%
C04BLime, magnesia4%
F24FAir-conditioning4%
F28DHeat-exchange apparatus, not provided for in another subclass, in which the heat-exchange media do not come into direct contact4%
G21FProtection against x-radiation, gamma radiation, corpuscular radiation or particle bombardment4%
Y10TTechnical subjects covered by former us classification4%
F28FDetails of heat-exchange and heat-transfer apparatus, of general application3%
PatentTitleYear
10,942,345Image acquisition method and image acquisition device20219,030,061'Galvanoscanner and laser processing machine'20159,030,060'Galvanoscanner and laser processing machine'20158,780,429'Galvanoscanner and laser processing machine'20147,673,668'Spherical casting sand'20107,635,860'Manufacturing method of organic thin-film transistors and equipment for manufacturing the same'20097,629,714'Rocking actuator and laser machining apparatus'20097,612,479'Scanner for equalizing torque constant and reducing torque constant variation'20096,893,720'Object coated with carbon film and method of manufacturing the same'20056,846,363'Plasma processing apparatus and method'20056,833,051'Plasma processing apparatus and method'20046,756,737'Plasma processing apparatus and method'20046,564,744'Plasma CVD method and apparatus'20036,506,662'Method for forming an SOI substrate by use of a plasma ion irradiation'20036,499,424'Plasma processing apparatus and method'20026,481,370'Plasma processsing apparatus'20026,465,057'Plasma CVD method and apparatus'20026,388,382'Plasma processing apparatus and method'20026,180,019'Plasma processing apparatus and method'20016,136,386'Method of coating polymer or glass objects with carbon films'20006,076,598'Opposed flow heat exchanger'20006,032,730'Heat exchanger and method of manufacturing a heat exchanging member of a heat exchanger'20006,023,025'Electric wire and manufacturing method thereof'20005,938,527'Air ventilation or air supply system'19995,843,293'Arc-type evaporator'19985,653,106'Exothermic heat generating apparatus'19975,565,070'Solvent vapor sucking method and solvent recovering apparatus'19965,503,591'Apparatus for decontaminating substances contaminated with radioactivity'19965,356,661'Heat transfer insulated parts and manufacturing method thereof'19945,302,324'Method for decontaminating substances contaminated with radioactivity, and method for decontaminating the materials used for said decontamination'19945,126,077'Radioactive decontamination method using methylene chloride'19925,023,101'Shortening for hard butter product and process for producing hard butter product'19914,882,238'Die for use in forming lens'19894,634,600'Surface treatment process'19874,501,717'Sintering method using a plasma gas atmosphere'19854,485,080'Process for the production of diamond powder'19844,474,849'Coated hard alloys'19844,425,369'Cheese-containing composition for dessert making and process for producing the same'19844,383,957'Method of sintering a ceramic composition'1983Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1983–1994Patents assigned to SUMITOMO ELECTRIC INDUSTRIES (7)· patent assignee history
1983–1989Based in Itami, JP· patent location history
1992–1996Patents assigned to MORIKAWA SANGYO (3)· patent assignee history
1992–1996Based in Togura, JP· patent location history
1997–2000Patents assigned to MITSUBISHI ELECTRIC CORP (4)· patent assignee history
1998–2005Patents assigned to NISSIN ELECTRIC CO LTD (6)· patent assignee history
1999–2021Based in Tokyo, JP· patent location history
2001–2009Patents assigned to HITACHI LTD (8)· patent assignee history
2001–2005Based in Ibaraki, JP· patent location history
2009–2015Based in Hitachinaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 8 | 2001–2009 |
| SUMITOMO ELECTRIC INDUSTRIES | 7 | 1983–1994 |
| NISSIN ELECTRIC CO LTD | 6 | 1998–2005 |
| MITSUBISHI ELECTRIC CORP | 4 | 1997–2000 |
| MORIKAWA SANGYO | 3 | 1992–1996 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachinaka, JP | 6 | 2009–2015 |
| Itami, JP | 6 | 1983–1989 |
| Ibaraki, JP | 5 | 2001–2005 |
| Tokyo, JP | 4 | 1999–2021 |
| Togura, JP | 3 | 1992–1996 |