Inventor
Hajime Morishita
Inventor
Tokyo, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%
H01JElectric discharge tubes or discharge lamps32%
G03CPhotosensitive materials for photographic purposes22%
C03CChemical composition of glasses, glazes or vitreous enamels3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
G02BOptical elements, systems or apparatus3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
5,173,382'Photosensitive composition containing water-soluble binder and aromatic diazonium chromate forming fluorescent screens employing same'19925,081,394'Black matrix color picture tube'19925,024,920'Process for forming a pattern using a photosensitive azide and a high-molecular weight copolymer or polymer'19914,815,821'Face plate for display'19894,735,880'Photosensitive composition and pattern forming process using same'19884,612,268'Method of forming phosphor pattern on fluorescent screen for color picture tubes with polymer coagulent'19864,564,572'Process for forming pattern'19864,520,094'Process for forming powder pattern on light exposed layer having photosensitive diazonium salts'19854,510,226'Photosensitive composition and pattern forming process using same'19854,409,313'Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine'19834,377,630'Photosensitive composition'19834,318,971'Method of forming fluorescent screen of color picture tube'19824,276,363'Process for forming phosphor screens with treated phosphors'19814,273,842'Process for forming patternwise coated powder layer'19814,269,918'Process for forming patternwise coated powder layer'1981Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1981–1992Patents assigned to HITACHI LTD (15)· patent assignee history
1981–1992Based in Tokyo, JP· patent location history
1986Based in Ota, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 15 | 1981–1992 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 14 | 1981–1992 |
| Ota, JP | 1 | 1986 |