Inventor
Stefan Scharl
Inventor
Wasserburg, DE
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
8,248,581'Exposure system'20128,027,018'Method and device for producing exposed structures'20117,705,967'Exposure system'20107,652,750'Lithography exposure device having a plurality of radiation sources'20107,019,818'Apparatus for exposing substrate materials'20066,859,261'Lithography exposure device'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2011Patents assigned to KLEO HALBLEITERTECHNIK GMBH (4)· patent assignee history
2005–2012Based in Wasserburg, DE· patent location history
2010Patents assigned to KLEO MASCHB AG (1)· patent assignee history
2012Patents assigned to KLEO AG (1)· patent assignee history
2012Patents assigned to OPOWER HANS (1)· patent assignee history
2012Patents assigned to SCHARL STEFAN (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLEO HALBLEITERTECHNIK GMBH | 4 | 2005–2011 |
| KLEO AG | 1 | 2012 |
| KLEO MASCHB AG | 1 | 2010 |
| OPOWER HANS | 1 | 2012 |
| SCHARL STEFANself | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Wasserburg, DE | 6 | 2005–2012 |