Inventor
Bangching Ho
Inventor
Toyama, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01LSemiconductor devices18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
C08LCompositions of macromolecular compounds7%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
PatentTitleYear
10,437,150Composition for forming resist underlayer film with reduced outgassing20199,753,369'Polymer-containing developer'20179,627,217'Silicon-containing EUV resist underlayer film-forming composition including additive'20179,494,864'Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same'20169,240,327'Resist underlayer film-forming composition for EUV lithography containing condensation polymer'20169,005,873'Composition for forming resist underlayer film for EUV lithography'20158,722,840'Resist underlayer film forming composition, and method for forming resist pattern using the same'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2019Patents assigned to NISSAN CHEMICAL IND LTD (6)· patent assignee history
2014–2019Patents assigned to HO BANGCHING (4)· patent assignee history
2014–2019Patents assigned to SAKAMOTO RIKIMARU (4)· patent assignee history
2014–2019Patents assigned to ENDO TAKAFUMI (3)· patent assignee history
2014–2016Patents assigned to FUJITANI NORIAKI (2)· patent assignee history
2014–2019Based in Toyama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL IND LTD | 6 | 2014–2019 |
| HO BANGCHINGself | 4 | 2014–2019 |
| SAKAMOTO RIKIMARU | 4 | 2014–2019 |
| ENDO TAKAFUMI | 3 | 2014–2019 |
| FUJITANI NORIAKI | 2 | 2014–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 7 | 2014–2019 |