Inventor
HIRONARI SASAGAWA
Inventor
JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
H01JElectric discharge tubes or discharge lamps27%
C23CCoating metallic material9%
PatentTitleYear
12,112,954Etching method, substrate processing apparatus, and substrate processing system202411,961,746Substrate processing method and substrate processing apparatus202411,862,441Plasma processing method and plasma processing apparatus202411,810,791Etching method, substrate processing apparatus, and substrate processing system202311,728,166Substrate processing method and substrate processing apparatus202311,450,537Substrate processing method and substrate processing apparatus202211,380,555Etching method and etching apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2024Patents assigned to TOKYO ELECTRON LTD (7)· patent assignee history
2022–2024Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 7 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 7 | 2022–2024 |