Inventor
Ron Rulkens
Inventor
Milpitas, CA, US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation7%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
Y02PClimate change mitigation technologies in the production or processing of goods7%
H01LSemiconductor devices5%
H01JElectric discharge tubes or discharge lamps4%
C01BNon-metallic elements2%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%
PatentTitleYear
10,211,351Photovoltaic cell with high efficiency CIGS absorber layer with low minority carrier lifetime and method of making thereof201910,043,921Photovoltaic cell with high efficiency cigs absorber layer with low minority carrier lifetime and method of making thereof20189,255,323'Sputtering target including a feature to reduce chalcogen build up and arcing on a backing tube'20169,169,548'Photovoltaic cell with copper poor CIGS absorber layer and method of making thereof'20159,128,493'Method and apparatus for plating solution analysis and control'20158,622,017'Electroless plating system'20147,972,652'Electroless plating system'20117,913,644'Electroless deposition system'20117,790,633'Sequential deposition/anneal film densification method'20107,491,653'Metal-free catalysts for pulsed deposition layer process for conformal silica laminates'20097,297,608'Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition'20077,294,583'Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 films'20077,271,112'Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry'20077,223,707'Dynamic rapid vapor deposition process for conformal silica laminates'20077,202,185'Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer'20077,148,155'Sequential deposition/anneal film densification method'20067,129,189'Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD)'20067,097,878'Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 films'20067,064,227'Precursors for silica or metal silicate films'20066,919,279'Endpoint detection for high density plasma (HDP) processes'20056,762,849'Method for in-situ film thickness measurement and its use for in-situ control of deposited film thickness'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2010Patents assigned to NOVELLUS SYSTEMS INC (12)· patent assignee history
2004–2019Based in Milpitas, CA, US· patent location history
2011–2015Patents assigned to LAM RES CORP (4)· patent assignee history
2014–2016Patents assigned to RULKENS RON (4)· patent assignee history
2015–2016Patents assigned to APOLLO PREC FUJIAN LTD (2)· patent assignee history
2018–2019Patents assigned to BEIJING APOLLO DING RONG SOLAR TECH CO LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NOVELLUS SYSTEMS INC | 12 | 2004–2010 |
| LAM RES CORP | 4 | 2011–2015 |
| RULKENS RONself | 4 | 2014–2016 |
| APOLLO PREC FUJIAN LTD | 2 | 2015–2016 |
| BEIJING APOLLO DING RONG SOLAR TECH CO LTD | 2 | 2018–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Milpitas, California, US | 21 | 2004–2019 |