Inventor
HAN-LUNG CHANG
Inventor
TW
Overview
Patents· 34 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%
H05GX-ray technique30%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light11%
G02BOptical elements, systems or apparatus6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G01VGeophysics4%
G21KHandling of particles or ionising radiation not otherwise provided for4%
G05DSystems for controlling or regulating non-electric variables2%
H01LSemiconductor devices2%
B08BCleaning in general1%
PatentTitleYear
12,347,997Methods and systems for aligning master oscillator power amplifier systems202512,332,571Target control in extreme ultraviolet lithography systems using aberration of reflection image202512,298,664Advanced load port for photolithography mask inspection tool202512,302,484Droplet generator and method of servicing extreme ultraviolet imaging tool202512,193,136Apparatus and method for generating extreme ultraviolet radiation202512,189,311Reticle carrier and associated methods202512,147,166Mitigating long-term energy decay of laser devices202412,133,319Apparatus and method for generating extreme ultraviolet radiation202412,114,412Shock wave visualization for extreme ultraviolet plasma optimization202412,028,959EUV light source and apparatus for EUV lithography202411,997,778Replacement and refill method for droplet generator202411,979,971EUV light source and apparatus for lithography202411,973,302Methods and systems for aligning master oscillator power amplifier systems202411,921,431Advanced load port for photolithography mask inspection tool202411,860,544Target control in extreme ultraviolet lithography systems using aberration of reflection image202411,800,626Shock wave visualization for extreme ultraviolet plasma optimization202311,792,909Apparatus and method for generating extreme ultraviolet radiation202311,737,200Residual gain monitoring and reduction for EUV drive laser202311,720,035Mitigating long-term energy decay of laser devices202311,698,591System and method of discharging an EUV mask202311,687,011Reticle carrier and associated methods202311,681,234Mask for attracting charged particles and method for using the same202311,644,759Droplet generator and method of servicing extreme ultraviolet radiation source apparatus202311,617,255Droplet generator and method of servicing extreme ultraviolet imaging tool202311,599,030Droplet catcher, droplet catcher system of EUV lithography apparatus, and maintenance method of the EUV lithography apparatus202311,592,754Advanced load port for photolithography mask inspection tool202311,588,293Methods and systems for aligning master oscillator power amplifier systems202311,528,798Replacement method for droplet generator202211,470,710EUV light source and apparatus for EUV lithography202211,452,197Shock wave visualization for extreme ultraviolet plasma optimization202211,437,161Lithography apparatus and method for using the same202211,340,531Target control in extreme ultraviolet lithography systems using aberration of reflection image202211,212,903Apparatus and method for generating extreme ultraviolet radiation202111,153,958Extreme ultraviolet photolithography method2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (34)· patent assignee history
2021–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 34 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 34 | 2021–2025 |