Inventor
Yutaka Oka
Inventor
Kanagawa, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Cprimary
G03CPhotosensitive materials for photographic purposes13%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
C08LCompositions of macromolecular compounds8%
C22CAlloys6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
G03GElectrography4%
G11CStatic stores4%
PatentTitleYear
11,109,459Drive circuit and light emitting device202110,333,038LED module and method for manufacturing LED module20199,683,084'Curable silicone composition, cured product thereof, and optical semiconductor device'20177,782,696'Semiconductor storage device'20107,462,444'Image forming method for the photothermographic material'20087,235,352'Photothermographic material'20077,175,721'Method for preparing Cr-Ti-V type hydrogen occlusion alloy'20077,105,282'Image forming method using photothermographic material'20067,075,837'Redundancy relieving circuit'20066,569,536'Thermoconductive liquid silicone rubber composition for fixing rolls and a fluororesin coated fixing roll'20036,420,038'Liquid silicone rubber composition for fixing rolls and fluorocarbon resin-covered fixing roll'20026,416,924'Silver halide photographic material and method for processing the same'20026,297,291'Liquid silicone rubber composition of low specific gravity'20015,232,520'High-strength martensitic stainless steel having superior fatigue properties in corrosive and erosive environment and method of producing the same'19934,963,460'Light-sensitive material containing silver halide, reducing agent and polymerizable compound with silver halide outside and inside of microcapsules'19904,879,200'Light-sensitive material containing silver halide, reducing agent, polymerizable compound, and a quaternary ammonium development accelerator'19894,830,947'Light-sensitive material containing silver halide, reducing agent and polymerizable compound'19894,744,824'Method of producing metallic materials for the components of nuclear reactors'19884,725,533'Silver halide photographic material for wash-off relief image'19884,510,229'Lithographic photosensitive material'19854,289,523'Work tables in apparatus for blowing hollow glass articles'1981T0978001'Silver halide photographic photosensitive material'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–2006Patents assigned to FUJI PHOTO FILM CO LTD (7)· patent assignee history
1985–2008Based in Kanagawa, JP· patent location history
1988–1993Patents assigned to KAWASAKI STEEL CO (2)· patent assignee history
1988–2003Based in Chiba, JP· patent location history
2001–2003Patents assigned to DOW CORNING TORAY SILICONE (3)· patent assignee history
2006–2010Based in Tokyo, JP· patent location history
2007–2008Patents assigned to FUJIFILM CORP (2)· patent assignee history
2019Based in Kisarazu, JP· patent location history
2021Patents assigned to ABE SEIYA (1)· patent assignee history
2021Based in Miyagi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI PHOTO FILM CO LTD | 7 | 1985–2006 |
| DOW CORNING TORAY SILICONE | 3 | 2001–2003 |
| FUJIFILM CORP | 2 | 2007–2008 |
| KAWASAKI STEEL CO | 2 | 1988–1993 |
| ABE SEIYA | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 9 | 1985–2008 |
| Chiba, JP | 5 | 1988–2003 |
| Tokyo, JP | 2 | 2006–2010 |
| Miyagi, JP | 1 | 2021 |
| Kisarazu, JP | 1 | 2019 |