Inventor

Mina Onishi

Inventor

Tokyo, JP

Overview

2008–2021

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H05Kprimary

H05KPrinted circuits14%

C07CAcyclic or carbocyclic compounds11%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds11%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients7%

C08LCompositions of macromolecular compounds7%

H01CResistors7%

H01TSpark gaps7%

B22FWorking metallic powder4%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2008–2021Patents assigned to SHOWA DENKO KK (7)· patent assignee history

2008–2010Based in Kanagawa, JP· patent location history

2009Based in Kawasaki, JP· patent location history

2013–2014Patents assigned to ISHIHARA YOSHIMITSU (3)· patent assignee history

2013–2014Patents assigned to ONISHI MINA (3)· patent assignee history

2013–2014Patents assigned to AZUMA YUKIHIKO (2)· patent assignee history

2013–2021Based in Tokyo, JP· patent location history

2014Patents assigned to INOUE HIROFUMI (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations