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Inventor

Heinz Groenewald

Inventor
Hammah, DE

Overview

6→
Patents
2012–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds42%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry25%
Y02PClimate change mitigation technologies in the production or processing of goods25%
C07DHeterocyclic compounds8%
PatentTitleYear
10,189,756Adiabatic plug flow reactors and processes incorporating the same20198,933,280'Processes for the production of hydrofluoroolefins'20158,926,918'Isothermal multitube reactors'20158,581,012'Processes for the production of chlorinated and/or fluorinated propenes and higher alkenes'20138,558,041'Isothermal multitube reactors and processes incorporating the same'20138,338,627'Process for producing epoxides'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2015Patents assigned to DOW GLOBAL TECHNOLOGIES LLC (5)· patent assignee history
2012–2013Patents assigned to GROENEWALD HEINZ (3)· patent assignee history
2012–2015Based in Hammah, DE· patent location history
2013Patents assigned to CHAKRABORTY DEBASHIS (2)· patent assignee history
2013Patents assigned to EIFFLER JUERGEN (2)· patent assignee history
2013Patents assigned to HIRSEKORN KURT F (2)· patent assignee history
2019Based in Midland, MI, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DOW GLOBAL TECHNOLOGIES LLC52012–2015
GROENEWALD HEINZself32012–2013
CHAKRABORTY DEBASHIS22013
EIFFLER JUERGEN22013
HIRSEKORN KURT F22013
Locations
LocationPatentsSpan
Hammah, DE52012–2015
Midland, MI, US12019