Inventor
Mohamed A. Ditali
Inventor
Boise, ID, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Bprimary
H10BElectronic memory devices50%
H10DInorganic electric semiconductor devices50%
PatentTitleYear
6,887,763'Method for using thin spacers and oxidation in gate oxides'20056,635,540'Method for using thin spacers and oxidation in gate oxides'20036,448,143'Method for using thin spacers and oxidation in gate oxides'20026,383,881'Method for using thin spacers and oxidation in gate oxides'20026,261,913'Method for using thin spacers and oxidation in gate oxides'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2005Patents assigned to MICRON TECHNOLOGY INC (5)· patent assignee history
2001–2005Based in Boise, ID, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 5 | 2001–2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 5 | 2001–2005 |