Inventor

Tetsuo Aoyama

Inventor

Niigata, JP

Overview

1977–2013

Patent span

Chemistry

Primary field (CPC C)

Patents· 36 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%

C07CAcyclic or carbocyclic compounds10%

C11DDetergent compositions10%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%

B08BCleaning in general3%

H05KPrinted circuits3%

C01BNon-metallic elements2%

PatentTitleYear

8,545,716'Etching liquid composition'2013 7,399,365'Aqueous fluoride compositions for cleaning semiconductor devices'2008 7,341,827'Separation-material composition for photo-resist and manufacturing method of semiconductor device'2008 7,250,391'Cleaning composition for removing resists and method of manufacturing semiconductor device'2007 6,875,288'Cleaning agent and cleaning method'2005 6,686,322'Cleaning agent and cleaning process using the same'2004 6,638,694'Resist stripping agent and process of producing semiconductor devices using the same'2003 6,514,352'Cleaning method using an oxidizing agent, chelating agent and fluorine compound'2003 6,500,270'Resist film removing composition and method for manufacturing thin film circuit element using the composition'2002 6,462,005'Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device'2002 6,458,517'Photoresist stripping composition and process for stripping photoresist'2002 6,440,326'Photoresist removing composition'2002 6,372,410'Resist stripping composition'2002 6,265,309'Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same'2001 6,199,567'Method and apparatus for manufacturing semiconductor device'2001 5,972,862'Cleaning liquid for semiconductor devices'1999 5,962,385'Cleaning liquid for semiconductor devices'1999 5,911,836'Method of producing semiconductor device and rinse for cleaning semiconductor device'1999 5,846,695'Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit'1998 5,693,599'Flux washing agent'1997 5,630,904'Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent'1997 5,538,832'Developing solution for producing printed circuit boards and a process for producing printed circuit boards wherein the developing solution comprises a quaternary ammonium hydroxide and a quaternary ammonium carbonate'1996 5,393,386'Method for preparing aqueous quaternary ammonium hydroxide solution'1995 5,338,462'Active carbon materials, process for the preparation thereof and the use thereof'1994 5,242,879'Active carbon materials, process for the preparation thereof and the use thereof'1993 5,175,078'Positive type photoresist developer'1992 5,174,816'Surface treating agent for aluminum line pattern substrate'1992 4,776,929'Process for production of quaternary ammonium hydroxides'1988 4,613,684'Process for the preparation of carboxylic acid esters'1986 4,521,638'Process for preparation of tertiary olefins'1985 4,230,636'Process for producing dimethyl formamide'1980 4,224,243'Process for producing dimethyl formamide'1980 4,218,398'Process for producing dimethylformamide'1980 4,163,863'Process for preparing a methylphenol'1979 4,094,905'Process for producing dimethyl formamide'1978 4,013,725'Process for preparing hydroperoxide'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977–2005Patents assigned to MITSUBISHI GAS CHEMICAL CO (30)· patent assignee history

1977Based in Tokyo, JP· patent location history

1978–2005Based in Niigata, JP· patent location history

1997–2004Patents assigned to SHARP KK (4)· patent assignee history

2001–2002Patents assigned to TEXAS INSTRUMENTS INC (2)· patent assignee history

2003–2005Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history

2007–2008Patents assigned to EKC TECHNOLOGY K K (2)· patent assignee history

2007–2008Based in Kanagawa, JP· patent location history

2008–2013Based in Ikoma, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MITSUBISHI GAS CHEMICAL CO	30	1977–2005
SHARP KK	4	1997–2004
EKC TECHNOLOGY K K	2	2007–2008
TEXAS INSTRUMENTS INC	2	2001–2002
TOKYO ELECTRON LTD	2	2003–2005

Locations

Location	Patents	Span
Niigata, JP	31	1978–2005
Ikoma, JP	2	2008–2013
Kanagawa, JP	2	2007–2008
Tokyo, JP	1	1977