Inventor
Chengjiu Wu
Inventor
Morristown, NJ, US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Cprimary
C07CAcyclic or carbocyclic compounds26%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds15%
G02BOptical elements, systems or apparatus15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein13%
C07DHeterocyclic compounds8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
6,534,671'Photocurable halofluorinated acrylates'20036,512,874'High performance acrylate materials for optical interconnects'20036,379,590'Method for making unsymmetrically substituted fluorenyl compounds for nonlinear optical applications'20026,335,149'High performance acrylate materials for optical interconnects'20026,323,361'Photocurable halofluorinated acrylates'20016,166,156'Method for making photocurable halofluorinated acrylates'20006,114,090'Thermally-stable photopolymer composition and light transmissive device'20005,670,603'Polymers exhibiting nonlinear optical properties'19975,541,039'Method for forming optically active waveguides'1996RE035060'Fluorinated photoinitiators and their application in UV curing of fluorinated monomers'19955,391,587'Fluorinated photoinitiators and their application in UV curing of fluorinated monomers'19955,354,511'Unsymmetrically substituted fluorenes for non-linear optical applications'19945,274,179'Fluorinated photoinitiators and their application in UV curing of fluorinated monomers'19935,186,865'Electro-optical materials and light modulator devices containing same'19935,182,185'Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions'19935,061,404'Electro-optical materials and light modulator devices containing same'19915,053,470'Copolymers of hexafluoroisobutylene with vinyl esters and vinyl alcohol'19915,039,596'Deep u.v. photoresist process utilizing compositions containing polycyclic cyclopentane 2-diazo-1,3-dione'19915,036,142'Process for making electro-optically active polymers'19914,968,581'High resolution photoresist of imide containing polymers'19904,837,124'High resolution photoresist of imide containing polymers'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–1993Patents assigned to HOECHST CELANESE CORP (4)· patent assignee history
1989–2003Based in Morristown, NJ, US· patent location history
1991–2002Patents assigned to ALLIED SIGNAL INC (11)· patent assignee history
1993–2003Based in Morris, NJ, US· patent location history
2000–2003Patents assigned to CORNING INC (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ALLIED SIGNAL INC | 11 | 1991–2002 |
| CORNING INC | 5 | 2000–2003 |
| HOECHST CELANESE CORP | 4 | 1989–1993 |
Locations
| Location | Patents | Span |
|---|---|---|
| Morristown, New Jersey, US | 19 | 1989–2003 |
| Morris, New Jersey, US | 2 | 1993–2003 |