Inventor
Tomoyuki Matsuyama
Inventor
Kitakatsushika-gun, JP
Overview
Patents· 33 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%
G02BOptical elements, systems or apparatus12%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them10%
G06FElectric digital data processing9%
F21VFunctional features or details of lighting devices or systems thereof7%
G06VImage or video recognition or understanding4%
G08BSignalling systems, e.g. personal calling systems4%
G06KGraphical data reading3%
G06TImage data processing or generation, in general3%
H04NPictorial communication, e.g. television3%
PatentTitleYear
10,846,457Lithography system, simulation apparatus, and pattern forming method202010,338,480Lithography system, simulation apparatus, and pattern forming method201910,275,645Image determining device to determine the state of a subject201910,255,491Guidance system, detection device, and position assessment device201910,241,417Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method201910,234,756Scanner based optical proximity correction system and method of use201910,234,770Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method201910,120,291Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method201810,031,425Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method201810,007,194Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method20189,989,865Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method20189,753,363'Scanner based optical proximity correction system and method of use'20179,684,246'Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method'20179,684,247'Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method'20179,551,938'Light source optimizing method, exposure method, device manufacturing method, program, exposure apparatus, lithography system, light source evaluation method, and light source modulation method'20179,423,694'Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method'20169,286,416'Scanner based optical proximity correction system and method of use'20169,140,990'Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method'20159,047,751'Image determining device to determine the state of a subject'20158,365,107'Scanner based optical proximity correction system and method of use'20138,174,456'Control system and method for reducing directional error of antenna with biaxial gimbal structure'20127,515,247'Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device'20097,515,248'Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment'20097,423,731'Illumination optical system, exposure apparatus, and exposure method with polarized switching device'20087,405,803'Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium'20087,391,497'Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium'20087,230,682'Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium'20077,102,728'Imaging optical system evaluation method, imaging optical system adjustment method, exposure apparatus and exposure method'20066,639,651'Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus'20036,198,576'Projection optical system and exposure apparatus'20016,166,865'Projection optical system and exposure apparatus'20005,920,379'Projection exposure method and apparatus'19995,852,490'Projection exposure method and apparatus'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2020Patents assigned to NIKON CORP (27)· patent assignee history
2000–2001Based in Tokyo, JP· patent location history
2003–2019Based in Kitakatsushika-gun, JP· patent location history
2006–2019Based in Saitama, JP· patent location history
2009Based in Korihashi-machi, JP· patent location history
2012–2019Patents assigned to MATSUYAMA TOMOYUKI (7)· patent assignee history
2013–2019Patents assigned to NIKON PREC INC (4)· patent assignee history
2015–2019Patents assigned to HAGIWARA SATOSHI (2)· patent assignee history
2015–2018Patents assigned to HIROTA HIROYUKI (2)· patent assignee history
2015–2020Based in Kuki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 27 | 1998–2020 |
| MATSUYAMA TOMOYUKIself | 7 | 2012–2019 |
| NIKON PREC INC | 4 | 2013–2019 |
| HAGIWARA SATOSHI | 2 | 2015–2019 |
| HIROTA HIROYUKI | 2 | 2015–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kitakatsushika-gun, JP | 15 | 2003–2019 |
| Kuki, JP | 5 | 2015–2020 |
| Saitama, JP | 5 | 2006–2019 |
| Korihashi-machi, JP | 2 | 2009 |
| Tokyo, JP | 2 | 2000–2001 |