LexDanaLexDanabeta
Inventor

KICHUL UM

Inventor
KR

Overview

3→
Patents
2022–2024
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material30%
H01JElectric discharge tubes or discharge lamps30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01LSemiconductor devices10%
H03KPulse technique10%
PatentTitleYear
12,183,546Substrate processing apparatus202411,414,760Substrate support unit, thin film deposition apparatus including the same, and substrate processing apparatus including the same202211,274,369Thin film deposition method2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2024Patents assigned to ASM IP HOLDING BV (3)· patent assignee history
2022–2024Based in KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASM IP HOLDING BV32022–2024
Locations
LocationPatentsSpan
KR32022–2024