Inventor
Takao Sakase
Inventor
Rowley, MA, US
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps37%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
F16CShafts6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
C23CCoating metallic material5%
A61NElectrotherapy3%
B09BDisposal of solid waste not otherwise provided for3%
E03CDomestic plumbing installations for fresh water or waste water3%
G21GConversion of chemical elements3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
PatentTitleYear
11,024,437Neutron target for boron neutron capture therapy202110,462,893Method and system for surface modification of substrate for ion beam target20199,887,066'Systems for controlling a high power ion beam'20189,558,914'Bipolar wafer charge monitor system and ion implantation system comprising same'20178,759,803'Ion implant apparatus and a method of implanting ions'20148,633,458'Ion implant apparatus and a method of implanting ions'20148,435,804'Method and apparatus for forming a thin lamina'20138,378,317'Ion implant apparatus and method of ion implantation'20138,268,645'Method and apparatus for forming a thin lamina'20128,168,941'Ion beam angle calibration and emittance measurement system for ribbon beams'20128,124,946'Post-decel magnetic energy filter for ion implantation systems'20127,611,975'Method of implanting a substrate and an ion implanter for performing the method'20097,582,883'Method of scanning a substrate in an ion implanter'20097,479,644'Ion beam diagnostics'20097,282,427'Method of implanting a substrate and an ion implanter for performing the method'20077,253,424'Method of implanting a substrate and an ion implanter for performing the method'20077,235,797'Method of implanting a substrate and an ion implanter for performing the method'20077,049,210'Method of implanting a substrate and an ion implanter for performing the method'20066,956,223'Multi-directional scanning of movable member and ion beam monitoring arrangement therefor'20056,908,836'Method of implanting a substrate and an ion implanter for performing the method'20056,878,946'Indirectly heated button cathode for an ion source'20056,870,170'Ion implant dose control'20056,515,288'Vacuum bearing structure and a method of supporting a movable member'20036,501,078'Ion extraction assembly'20026,323,496'Apparatus for reducing distortion in fluid bearing surfaces'20016,274,875'Fluid bearing vacuum seal assembly'20016,271,530'Apparatus for reducing distortion in fluid bearing surfaces'20015,838,012'Charge exchange cell'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998Based in North Reading, MA, US· patent location history
2001–2009Patents assigned to APPLIED MATERIALS INC (16)· patent assignee history
2001–2021Based in Rowley, MA, US· patent location history
2012–2014Patents assigned to SAKASE TAKAO (6)· patent assignee history
2012–2014Patents assigned to RYDING GEOFFREY (4)· patent assignee history
2012–2014Patents assigned to SMICK THEODORE (4)· patent assignee history
2013–2014Patents assigned to GTAT CORP (4)· patent assignee history
2019Based in Rawley, MA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 16 | 2001–2009 |
| SAKASE TAKAOself | 6 | 2012–2014 |
| GTAT CORP | 4 | 2013–2014 |
| RYDING GEOFFREY | 4 | 2012–2014 |
| SMICK THEODORE | 4 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rowley, Massachusetts, US | 26 | 2001–2021 |
| Rawley, Massachusetts, US | 1 | 2019 |
| North Reading, Massachusetts, US | 1 | 1998 |