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Inventor

Cheng-Hao Lai

Inventor
Taichung, TW

Overview

2→
Patents
2019–2020
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H05GX-ray technique50%
PatentTitleYear
10,670,970Lithography system and method thereof202010,331,035Light source for lithography exposure process2019

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2019–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history
2019–2020Based in Taichung, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD22019–2020
Locations
LocationPatentsSpan
Taichung, TW22019–2020