Inventor
Piotr Strzyzewski
Inventor
Herzogenrath, DE
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material30%
B01DSeparation10%
B05CApparatus for applying fluent materials to surfaces, in general10%
B05DProcesses for applying fluent materials to surfaces, in general10%
B82YSpecific uses or applications of nanostructures10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
Y10TTechnical subjects covered by former us classification10%
PatentTitleYear
8,906,456'Apparatus and method for high-throughput chemical vapor deposition'20146,908,838'Method and device for treating semiconductor substrates'20056,849,241'Device and method for depositing one or more layers on a substrate'20056,089,548'Process and device for converting a liquid stream flow into a gas stream flow'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000Patents assigned to FRAUNHOFER GES FORSCHUNG (1)· patent assignee history
2000Based in Uttenreuth, DE· patent location history
2005Patents assigned to AIXTRON AG (2)· patent assignee history
2005–2014Based in Herzogenrath, DE· patent location history
2014Patents assigned to AIXTRON INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AIXTRON AG | 2 | 2005 |
| AIXTRON INC | 1 | 2014 |
| FRAUNHOFER GES FORSCHUNG | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Herzogenrath, DE | 3 | 2005–2014 |
| Uttenreuth, DE | 1 | 2000 |