Inventor
WILLIAM E. GUTHRIE
Inventor
US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps42%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G05BControl or regulating systems in general25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
PatentTitleYear
12,243,712Method and system for determining a charged particle beam exposure for a local pattern density202511,886,166Method and system of reducing charged particle beam write time202411,756,765Method and system for determining a charged particle beam exposure for a local pattern density202311,604,451Method and system of reducing charged particle beam write time202311,592,802Method and system of reducing charged particle beam write time2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2025Patents assigned to D2S INC (5)· patent assignee history
2023–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| D2S INC | 5 | 2023–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 5 | 2023–2025 |