Inventor

Zheng John Ye

Inventor
Santa Clara, CA, US

Overview

17→
Patents
2014–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps24%
C23CCoating metallic material20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01LSemiconductor devices14%
B05BSpraying apparatus4%
B05CApparatus for applying fluent materials to surfaces, in general2%
C23FNon-mechanical removal of metallic material from surface2%
C30BSingle-crystal growth2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
G01RMeasuring electric variables2%
PatentTitleYear
10,943,803Methods and assemblies for gas flow ratio control202110,930,543Thermal processing susceptor202110,879,041Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers202010,663,491Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the same202010,625,277Showerhead having a detachable gas distribution plate202010,580,623Plasma processing using multiple radio frequency power feeds for improved uniformity202010,450,653High impedance RF filter for heater with impedance tuning device201910,403,535Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system201910,325,800High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materials201910,125,422High impedance RF filter for heater with impedance tuning device201810,128,088Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films201810,100,408Edge hump reduction faceplate by plasma modulation20189,824,862'Symmetric VHF source for a plasma reactor'20179,610,591'Showerhead having a detachable gas distribution plate'20179,305,749'Methods of directing magnetic fields in a plasma source, and associated systems'20168,920,597'Symmetric VHF source for a plasma reactor'20148,878,926'Apparatus and method for analyzing thermal properties of composite structures'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2021Patents assigned to APPLIED MATERIALS INC (17)· patent assignee history
2014Patents assigned to COLLINS KENNETH S (2)· patent assignee history
2014Patents assigned to RAMASWAMY KARTIK (2)· patent assignee history
2014Patents assigned to YE ZHENG JOHN (2)· patent assignee history
2014Patents assigned to CARDUCCI JAMES D (1)· patent assignee history
2014–2020Based in Santa Clara, CA, US· patent location history
2018Based in Milpitas, CA, US· patent location history
2021Based in San Jose, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC172014–2021
COLLINS KENNETH S22014
RAMASWAMY KARTIK22014
YE ZHENG JOHNself22014
CARDUCCI JAMES D12014
Locations
LocationPatentsSpan
Santa Clara, California, US142014–2020
San Jose, California, US22021
Milpitas, California, US12018